A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope

• Frances I. Allen

Beilstein J. Nanotechnol. 2021, 12, 633–664, doi:10.3762/bjnano.12.52

• square frame and annulus patterns, respectively, with increasing dose from the perimeter to the center (Figure 3e, bottom). This tumefaction technique has the potential to be used to fabricate molds for nanoimprint lithography. In a recent study, localized helium ion implantation into diamond

• that the helium ions deposit their energy over much shorter distances in the resist, thus increasing the local energy density. HIBL has also been combined with nanoimprint lithography, achieving lines down to a half-pitch of 4 nm [130]. In this technique, the helium ion beam is first used to pattern a

Angle-dependent structural colors in a nanoscale-grating photonic crystal fabricated by reverse nanoimprint technology

• Xu Zheng,
• Qing Wang,
• Jinjin Luan,
• Yao Li,
• Ning Wang and
• Rui Zhang

Beilstein J. Nanotechnol. 2019, 10, 1211–1216, doi:10.3762/bjnano.10.120

• reverse nanoimprint lithography. The periodicity and the structural color were investigated through measuring reflection spectra. The structural color of the photonic crystal has a period of 90°. Distinctive colors spanning the entire visible spectrum can be seen when the crystal is rotated. In addition

• , there is a blue-shift of the peak wavelength when the observation angle is increased. An equation for the observed wavelength as a function of the observation angle is proposed. Keywords: observation angle; photonic crystal; reverse nanoimprint lithography; structural color; visualized sensor

• of applications, not only due to their compact structures, simple fabrication process and excellent spectral characteristics, but also because reflection wavelength and observation angle are closely connected [5][6][7]. At present, nanoimprint lithography (NIL) and self-assembly are the two main

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe

• . The multibeam scanning electron microscope (MBSEM) introduced in Section 2.2.1 can be used to enhance the throughput by a factor of 196 [14][45][46]. But, for large-area manufacturing of single nanometer structures and devices, massively parallel lithography techniques, such as nanoimprint lithography

Performance analysis of rigorous coupled-wave analysis and its integration in a coupled modeling approach for optical simulation of complete heterojunction silicon solar cells

• Ziga Lokar,
• Benjamin Lipovsek,
• Marko Topic and
• Janez Krc

Beilstein J. Nanotechnol. 2018, 9, 2315–2329, doi:10.3762/bjnano.9.216

• into solar cells [1][2][3][4][5]. The use of different techniques for the wet and dry etching of Si wafers [6] in combination with thermal or UV nanoimprint lithography [6][7] has opened new potential for design of (nano)textures with superior antireflection, light scattering and trapping properties

• textures that are commonly applied in HJ Si solar cells. The first one can be experimentally realized on the nanometer scale by UV nanoimprint lithography (NIL) in combination with dry and wet etching of the wafer [6]. The second, the random pyramid texture, is typically used as a microtexture in c-Si

Evaluation of replicas manufactured in a 3D-printed nanoimprint unit

• Manuel Caño-García,
• Morten A. Geday,
• Manuel Gil-Valverde,
• Xabier Quintana and
• José M. Otón

Beilstein J. Nanotechnol. 2018, 9, 1573–1581, doi:10.3762/bjnano.9.149

• Manuel Cano-Garcia Morten A. Geday Manuel Gil-Valverde Xabier Quintana Jose M. Oton CEMDATIC, ETSI Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, 28040-Madrid, Spain 10.3762/bjnano.9.149 Abstract Nanoimprint lithography has become a useful tool to prepare elements

• of a solvent were found to be superior for most nanoimprint applications. A large dispersion of the samples was found. Keywords: nanoimprint; oriented gradient; photoresist; polymer; replica; Introduction Although the basic principles behind nanoimprint lithography (NIL) have been known for many

Refractive index sensing and surface-enhanced Raman spectroscopy using silver–gold layered bimetallic plasmonic crystals

• Somi Kang,
• Sean E. Lehman,
• Matthew V. Schulmerich,
• An-Phong Le,
• Tae-woo Lee,
• Stephen K. Gray,
• Rohit Bhargava and
• Ralph G. Nuzzo

Beilstein J. Nanotechnol. 2017, 8, 2492–2503, doi:10.3762/bjnano.8.249

• generating these plasmonic features [28][29][30][31][32][33]. Our work in this area has exploited soft nanoimprint lithography, a technique that permits reproducible replication of precisely defined nanometer-sized features over a large area (greater than 1 × 1 cm2), as a way to fabricate quantitative

• nanoimprint lithography The PCs were fabricated using soft nanoimprint lithography as previously reported [22][23][24][25][26][37][38]. In brief, a composite hard-PDMS/soft-PDMS mixture was cast on a patterned photoresist master with arrays of nanohole relief structures in order to fabricate the PCs. A glass

• to changes in the local environment [48][49][50]. In this study, we used square arrays of nanoholes molded into the surface of an inorganic SOG film using soft nanoimprint lithography. The SOG-supported PC structure affords a chemically and thermally stable sub-wavelength optical device, especially

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• resistive to UV/O3 oxidation. The ALD-coated DNA templates were used for a direct pattern transfer to poly(L-lactic acid) films. Keywords: aluminium oxide (Al2O3); atomic layer deposition; DNA nanostructure; nanofabrication; nanoimprint lithography; pattern transfer; polymer stamp; replica molding

A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls

• Carlos Angulo Barrios and
• Víctor Canalejas-Tejero

Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124

• lithography techniques, such as nanoimprint lithography [15], deep UV lithography [16] and interference lithography [17], could be also employed instead of EBL to favor mass production of the nanocages. The pattern design flexibility offered by these lithography tools allows the creation of arbitrary layouts

Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting

• Sun-Kyu Lee,
• Sori Hwang,
• Yoon-Kee Kim and
• Yong-Jun Oh

Beilstein J. Nanotechnol. 2017, 8, 1049–1055, doi:10.3762/bjnano.8.106

• as a functional layer. Thus, the applicability of a self-assembly technique that uses dewetting largely depends on how it can be combined with appropriate template materials that have both functionality and dewettability. In this regard, nanoimprint lithography (NIL) is expected to be an effective

Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

• Alexandra M. Greiner,
• Adria Sales,
• Hao Chen,
• Sarah A. Biela,
• Dieter Kaufmann and
• Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

• lithography [66]), etching (focused-ion beam [67] and electron-beam nanolithography [68]), electrical (electrospinning [69][70][71][72]), mechanical (nanoskiving [46][73], nanoimprint lithography [66]) and colloidal (colloidal lithgraphy [74][75]) are given here. Nanoscale optical photolithography takes

• a different work, a plasmon was used to pattern a photoresist layer by means of NSOM (near-field scanning optical microscopy). A lateral resolution of about 50 nm was achieved, with a fabrication speed of ca 10 mm/s [65]. Nanoimprint lithography (NIL) is a low-cost nanopatterning technique for 2D

• techniques Nanofabrication techniques are mainly used to generate surface structures in the nanometer range. Similar to the previous section, relevant examples of nanofabrication techniques using different approaches, such as optical (nanometer-scale optical photolithography [49][58][64][65], nanoimprint

Large-scale fabrication of achiral plasmonic metamaterials with giant chiroptical response

• Morten Slyngborg,
• Yao-Chung Tsao and
• Peter Fojan

Beilstein J. Nanotechnol. 2016, 7, 914–925, doi:10.3762/bjnano.7.83

• aluminum foil, nanoimprint lithography and glancing angle deposition. All of these techniques are scalable and pose a significant improvement to standard metamaterial fabrication techniques. Different interpore distances and glancing angle depositions enable the plasmonic resonance wavelength to be tunable

• nanotubes [27] and larger U-shaped structures by nanoimprint lithography (NIL) [38] which have been scalably fabricated. In the present work we present a novel route towards the large-scale fabrication of ECMs and metamaterials in general. These structures have never been reported before and add to the

• ]. The original molds were used to make negative imprints by thermal nanoimprint lithography using the EVG520HE semi-automated hot embossing system. This was done in TOPAS 5013L-10 substrates under vacuum with a stamping pressure of 1.25 bar and at 160 °C using the original molds. Next a 30 nm film was

Surface-enhanced Raman scattering by colloidal CdSe nanocrystal submonolayers fabricated by the Langmuir–Blodgett technique

• Alexander G. Milekhin,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Volodymyr M. Dzhagan,
• Ovidiu D. Gordan,
• Sergey L. Veber,
• Cameliu Himcinschi,
• Alexander V. Latyshev and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2015, 6, 2388–2395, doi:10.3762/bjnano.6.245

• can be fabricated by means of electron-beam lithography [34][35], nanoimprint lithography [36][37], or nanosphere lithography [38][39], the deposition of homogeneous films of CdSe NCs is possible by using Langmuir–Blodgett (LB) technology [40][41][42][43]. In this paper we report on the study of

Scalable, high performance, enzymatic cathodes based on nanoimprint lithography

• Dmitry Pankratov,
• Richard Sundberg,
• Javier Sotres,
• Dmitry B. Suyatin,
• Ivan Maximov,
• Sergey Shleev and
• Lars Montelius

Beilstein J. Nanotechnol. 2015, 6, 1377–1384, doi:10.3762/bjnano.6.142

• , enzymatic electrodes for oxygen bio-electroreduction, which can be easily and reproducibly fabricated with industry-scale throughput. Planar and nanostructured electrodes were built on biocompatible, flexible polymer sheets, while nanoimprint lithography was used for electrode nanostructuring. To the best

• of our knowledge, this is one of the first reports concerning the usage of nanoimprint lithography for amperometric bioelectronic devices. The enzyme (Myrothecium verrucaria bilirubin oxidase) was immobilised on planar (control) and artificially nanostructured, gold electrodes by direct physical

• : bilirubin oxidase; bio-electrocatalysis; direct electron transfer; nanoimprint lithography; oxygen reduction reaction; Introduction Reduction of oxygen (O2) is the key reaction in many natural and artificial systems, and indeed, this reaction is one of the most interesting research issues in both academia

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• them very attractive for the fabrication of hard nanoimprint lithography molds and etching masks, as well as for nanoelectronic and nanophotonic applications, MEMS and NEMS devices. Experimental Sample preparation All the preparation procedures were conducted in a class 10,000 clean room. The PMMA A2

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

• Burcin Özdemir,
• Axel Seidenstücker,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

• for subsequent etching, nanoimprint lithography has been suggested and successfully demonstrated for preparing Si pillar arrays. For that purpose, a tri-layer imprint stack is prepared on top of a Si wafer and the sought pattern is transferred by a pre-fabricated mold imprinted into the top polymer

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• immobilisation of single AuNPs by chemically structured surfaces has been introduced [11][12]. Appropriate surfaces can be obtained either by resist-based EBL and subsequent etching [11] or by soft lithographic techniques such as nanoimprint lithography [12]. As an example, Onses et al. demonstrated the

Ordered arrays of nanoporous gold nanoparticles

• Dong Wang,
• Ran Ji,
• Arne Albrecht and
• Peter Schaaf

Beilstein J. Nanotechnol. 2012, 3, 651–657, doi:10.3762/bjnano.3.74

• size) by varying the period of the structure, total metal layer thickness, and the thickness ratio of the as-deposited bilayers. Keywords: dealloying; dewetting; nanoimprint lithography; nanoparticles; nanoporous gold; ordered arrays; Introduction Metallic nanoparticle arrays are attracting more and

• on the Si wafer, and then an array of holes was defined by SCIL. SCIL was developed as a new nanoimprint lithography technique that combines the advantages of both UV nanoimprint lithography techniques, with a rigid stamp for best resolution and with a soft stamp for large-area patterning [23]. The

Fabrication of multi-parametric platforms based on nanocone arrays for determination of cellular response

• Lindarti Purwaningsih,
• Tobias Schoen,
• Tobias Wolfram,
• Claudia Pacholski and
• Joachim P. Spatz

Beilstein J. Nanotechnol. 2011, 2, 545–551, doi:10.3762/bjnano.2.58

• lack of nanofabrication techniques to generate functional structures. Recent advances in nanofabrication techniques such as nanoimprint lithography (NIL) [9], nanosphere/colloidal lithography [10], dip pen lithography [11], e-beam lithography [12] have enabled and motivated biomaterial development

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• nm. Nanoimprint lithography [55][56] is another alternative technique in which a pattern is formed on top of a substrate by pressing a mold against a thin resist film, followed by reactive ion etching (RIE) of the patterned substrate. This allows patterning of reproducible structures up to a few tens

Formation of precise 2D Au particle arrays via thermally induced dewetting on pre-patterned substrates

• Dong Wang,
• Ran Ji and
• Peter Schaaf

Beilstein J. Nanotechnol. 2011, 2, 318–326, doi:10.3762/bjnano.2.37

• thickness had to be adjusted in a certain thickness-window in order to achieve the precise 2D particle arrays. Keywords: Au particles; dewetting; nanoimprint lithography; nanoparticle array; Introduction An increasing amount of scientific attention is being paid to the ordered arrangement of metallic

• . induced by annealing, has been studied, on both the flat substrate and two types of pre-patterned substrates (one with an array of pyramidal pits and one with an array of circular holes, made using nanoimprint lithography), and large areas of 2D ordered nanoparticle arrays were fabricated. Instead of the

• technique, which was developed by Philips Research and SUSS MicroTec, combines the advantages of both UV nanoimprint lithography techniques with rigid stamp for the best resolution and with soft stamp for the large-area (6 inch area) patterning. Thermal oxide several nanometers thick was grown on the pre